Kloe will be present in Grenoble from 15th to 16th of March 2018 during GDR Microfluidique.

Come to try the UV-KUB 6, a masking system for samples until 6” wafers.

This soft lithography system offers high resolution and real capabilities to pattern thick layer resists until several hundred of microns without inducing cracks, thanks to the “cold UV” light source based on UV LED s.