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News : laser lithography systems & Uv led exposure

Find the latest news from Kloé all about the area of laser photolithography and direct writing. New machines, innovations, market evolutions, lithography guides and press reviews, follow all our news.

Published on: 02/09/2021 - 11:57

Kloé is proud for being quoted in 3 articles in the famous magazine Nature.

Published on: 11/12/2020 - 15:17

Our mask aligners don’t need any external intervention to be installed!

Published on: 09/07/2020 - 15:42

Kloé will be present in Rotterdam from 9th to 10th of September 2020 during Lab-on-a-Chip and Microfluidics.

Published on: 06/30/2020 - 10:23

There is a newborn in the UV-KUB range!

Published on: 06/23/2020 - 09:24

Despite the sanitary crisis and its exceptional circumstances, our production capacity still goes on. 

Published on: 06/17/2020 - 08:55

Early 2020, we welcome friends, suppliers, customers… in our new facilities, in St-Mathieu-de-Tréviers, for an opening event. For those who couldn’t be present this time, here is a little tour of this new workplace!

Published on: 05/26/2020 - 10:40

At the end of 2019, Kloé moved in renovated facilities, in Saint-Mathieu-de-Tréviers, North of Montpellier, amidst the vineyards of Pic Saint Loup. 

Published on: 11/19/2018 - 15:52
On the occasion of Microtas 2018 in Kaohsiung, KLOE gathered its commercial partners from Taïwan, China, Japan and Thailand on its booth to offer the best service to its customers. KLOE, as the only Industrial sponsor, met a huge success, especially with its new High-Resolution 3D Printer “Dilase 3D”, which specifically meets the expectations from the Academic Microfluidic community as much as the industrials.
Published on: 11/07/2018 - 16:44

For the 4th time, Kloé will sponsor the 22th International conference on Miniaturized Systems for Chemistry and Life Sciences, dedicated to microfluidics, Lab on a chip and Organ on a chip.

Published on: 03/15/2018 - 11:18

Come to try the UV KUB 6, a masking system for samples until 6” wafers. This soft lithography system offers high resolution and real capabilities to pattern thick layer resists until several hundred of microns without inducing cracks, thanks to the “cold UV” light source based on UV LED s.