Testimonial of Dr Steven Johnson, from University of York, about our direct laser writer Dilase 650

We conduct research at the interface between physics, engineering and biology. As a result, we are interested in equipment that is easy to use, reliable and, perhaps most importantly, offers the flexibility we need to conduct our interdisciplinary research. The Kloe Dilase 650 direct laser lithography system meets these demands perfectly. The choice of beam lines, writing conditions and resists allows us to optimise our lithographic processes precisely, ensuring reliable and rapid fabrication while the very large depth of focus allows us to fabricate high resolution devices with extraordinary aspect ratios.